500L/H Semiconductor Ultrapure Water System for a variety of purposes, from equipment cooling, wet etching, solvent treatment and chemical mechanical leveling to wafer surface cleaning.
The system for microelectronics and semiconductor rinse water removes contaminants, minerals, microorganisms and trace chemicals to produce ultrapure water (UPW) that meets the stringent purity requirements required in manufacturing.
The 500L/H Semiconductor Ultrapure Water System controls these parameters well, including:
- Resistivity
- Dissolved Oxygen (DO)
- Total Organic Carbon (TOC)
- Bacteria
- Ions
- Metals
- Silica
- Particulate Matter .
Multi-stage water treatment process:
1. Pre-treatment:
Water is filtered through a double-layer filter and then activated carbon before final softening with a cation resin, the latter step is to limit the risk of scaling and scale affecting the first reverse osmosis.
2. Additional water treatment:
This treatment method includes a second reverse osmosis and deionization.
3. Polishing and distribution loop:
Distributes water continuously flowing around, thus avoiding any stagnant points where bacteria can reproduce.
Technical parameters:
- Capacity: 500 L/H
- Resistivity > 5 MΩ
- TOC < 100 ppb
