Ultrapure water purification system for semiconductors and pharmaceuticals 500L/H purifies water to a high degree, completely removing minerals, particles, bacteria, microorganisms and dissolved gases. This water is also called DIW (deionized water), because all ionic components have been removed.
The semiconductor industry uses water as a washing agent in various stages related to the production of components and the quality of water is of vital importance to the production process (directly related to memory, microprocessors and other product removal levels).
The pharmaceutical industry uses ultrapure water for washing, mixing drugs.
Ultrapure water purification system for semiconductors and pharmaceuticals needs to control the following indicators well:
- Resistivity
- Dissolved oxygen (DO)
- Total organic carbon (TOC)
- Bacteria
- Ions
- Metals
- Silica
- Particulate matter .
Water treatment process:
1. Pre-treatment:
Water is filtered through a double-layer filter and then activated carbon before final softening with a cation resin, the latter step is to limit the risk of scaling and scale affecting the first reverse osmosis.
2. Additional water treatment:
This treatment method includes a second reverse osmosis and deionization, TOC.
3. Polishing and distribution ring:
Distributes water continuously flowing around, thus avoiding any stagnant points where bacteria can reproduce.
Technical parameters:
- Capacity: 500 L/H
- Resistivity > 17 MΩ
- TOC < 50 ppb
