1,000L/H Microelectronics Ultrapure Water Purification System Meets ASTM and SEMI Standards for Semiconductor Industry Factories.
Treating raw water to the required purity levels in semiconductor manufacturing requires a series of advanced processes and powerful water treatment technologies to remove contaminants, minerals, microorganisms and trace organic and inorganic chemicals, including other nanoparticles.
1,000L/H Microelectronics Ultrapure Water Purification System ensures good control of the following parameters:
- Resistivity
- Dissolved Oxygen (DO)
- Total Organic Carbon (TOC)
- Bacteria
- Ions
- Metals
- Silica and Boron
- Particulate Matter .
Water treatment process for electronic circuits through many stages:
1. Pre-treatment:
Water is filtered through a double-layer filter and then through activated carbon before being finally softened with a cation resin, the latter step is to limit the risk of scaling and scaling affecting the first reverse osmosis.
2. Additional water treatment:
This treatment method includes secondary osmosis, TOC reduction and Ion reduction,
3. Polishing and distribution ring:
Distribute water continuously flowing around, thus avoiding any stagnant points where bacteria can regenerate, ensuring that the water is always ion and TOC free.
Technical parameters:
- Capacity: 1,000 L/H
- Resistivity > 16 MΩ
- TOC < 50 ppb
