The semiconductor industry uses water as a washing agent in various stages related to the production of components and the quality of water is of vital importance to the production process (directly related to memory, microprocessors and other product removal levels).

The pharmaceutical industry uses ultrapure water for washing, mixing drugs.

Ultrapure water purification system for semiconductors and pharmaceuticals needs to control the following indicators well:

• Resistivity
• Dissolved oxygen (DO)
• Total organic carbon (TOC)
• Bacteria
• Ions
• Metals
• Silica
• Particulate matter .

Water treatment process:

1. Pre-treatment:

Water is filtered through a double-layer filter and then activated carbon before final softening with a cation resin, the latter step is to limit the risk of scaling and scale affecting the first reverse osmosis.

2. Additional water treatment:

This treatment method includes a second reverse osmosis and deionization, TOC.

3. Polishing and distribution ring:

Distributes water continuously flowing around, thus avoiding any stagnant points where bacteria can reproduce.

Technical parameters:

• Capacity: 500 L/H
• Resistivity > 17 MΩ
• TOC < 50 ppb

Treating raw water to the required purity levels in semiconductor manufacturing requires a series of advanced processes and powerful water treatment technologies to remove contaminants, minerals, microorganisms and trace organic and inorganic chemicals, including other nanoparticles.

1,000L/H Microelectronics Ultrapure Water Purification System ensures good control of the following parameters:

• Resistivity
• Dissolved Oxygen (DO)
• Total Organic Carbon (TOC)
• Bacteria
• Ions
• Metals
• Silica and Boron
• Particulate Matter .

Water treatment process for electronic circuits through many stages:

1. Pre-treatment:

Water is filtered through a double-layer filter and then through activated carbon before being finally softened with a cation resin, the latter step is to limit the risk of scaling and scaling affecting the first reverse osmosis.

2. Additional water treatment:

This treatment method includes secondary osmosis, TOC reduction and Ion reduction,

3. Polishing and distribution ring:

Distribute water continuously flowing around, thus avoiding any stagnant points where bacteria can regenerate, ensuring that the water is always ion and TOC free.

Technical parameters:

• Capacity: 1,000 L/H
• Resistivity > 16 MΩ
• TOC < 50 ppb

The system for microelectronics and semiconductor rinse water removes contaminants, minerals, microorganisms and trace chemicals to produce ultrapure water (UPW) that meets the stringent purity requirements required in manufacturing.

The 500L/H Semiconductor Ultrapure Water System controls these parameters well, including:

• Resistivity
• Dissolved Oxygen (DO)
• Total Organic Carbon (TOC)
• Bacteria
• Ions
• Metals
• Silica
• Particulate Matter .

Multi-stage water treatment process:

1. Pre-treatment:

Water is filtered through a double-layer filter and then activated carbon before final softening with a cation resin, the latter step is to limit the risk of scaling and scale affecting the first reverse osmosis.

2. Additional water treatment:

This treatment method includes a second reverse osmosis and deionization.

3. Polishing and distribution loop:

Distributes water continuously flowing around, thus avoiding any stagnant points where bacteria can reproduce.

Technical parameters:

• Capacity: 500 L/H
• Resistivity > 5 MΩ
• TOC < 100 ppb

XNN Tanano

The test is conducted by Institute of Natural Product Chemistry, a member of Vietnam Academy of Science and Technology.

• Part number: TWF-UPW6-UV-50 (100)
• The Ultrapure Water Systems is used to produce water with highest purity.
• The system is fully automatic controlled.
• Built-in Reverse Osmosis pretreatment lowers operating cost by economically removing 95-98% of the contaminants from the tap water.
• Combination Deionization and Reverse Osmosis to ensure water quality and prevent the growth of microorganisms within the system.
• Conductivity: < 5 μS/cm
• Capacity: 8 – 10 LPH (or 15 – 20 LPH)

Specification:

• Sediment filter (optional)
• Activated Carbon Block
• RO membrane
• Tanano UltraPure 101
• Tanano UltraPure 102
• Tanano UltraPure 103IL
• UV lamp

Applications:

• Electronics
• Plating Industries
• Humidification Water
• Boiler Water
• Food Industries
• Chemical Analysis
• Chemical Production
• Hospital Process Water

• Part number: TWF-UPW5-UV-50 (100)
• The DI systems is used to produce water with highest purity.
• The DI system is a fully automatic controlled system.
• Built-in Reverse Osmosis pretreatment lowers operating cost by economically removing 95-98% of the contaminants from the tap water.
• Combination Deionization and Reverse Osmosis to ensure water quality and prevent the growth of microorganisms within the system.
• Conductivity: < 10 μS/cm
• Capacity: 8 – 10 LPH (or 15 – 20 LPH)

Specification:

• Sediment filter (optional)
• Activated Carbon Block
• RO membrane
• Tanano UltraPure 101
• Tanano UltraPure 102
• UV lamp

Applications:

• Electronics
• Plating Industries
• Humidification Water
• Boiler Water
• Food Industries
• Chemical Analysis
• Chemical Production
• Hospital Process Water

• Part number: TWF-UPW5-50 (100)
• The Ultrapure Water Systems is used to produce water with highest purity.
• The system is fully automatic controlled.
• Built-in Reverse Osmosis pretreatment lowers operating cost by economically removing 95-98% of the contaminants from the tap water.
• Combination Deionization and Reverse Osmosis to ensure water quality and prevent the growth of microorganisms within the system.
• Conductivity: < 5 μS/cm
• Capacity: 8 – 10 LPH (or 15 – 20 LPH)

Specification:

• Sediment filter (optional)
• Activated Carbon Block
• RO membrane
• Tanano UltraPure 101
• Tanano UltraPure 102
• Tanano UltraPure 103IL

Applications:

• Electronics
• Plating Industries
• Humidification Water
• Boiler Water
• Food Industries
• Chemical Analysis
• Chemical Production
• Hospital Process Water

• Part number: TWF-UPW4-50 (100)
• The DI systems is used to produce water with highest purity.
• The DI system is a fully automatic controlled system.
• Built-in Reverse Osmosis pretreatment lowers operating cost by economically removing 95-98% of the contaminants from the tap water.
• Combination Deionization and Reverse Osmosis to ensure water quality and prevent the growth of microorganisms within the system.
• Conductivity: < 10 μS/cm
• Capacity: 8 – 10 LPH (or 15 – 20 LPH)

Specification:

• Sediment filter (optional)
• Activated Carbon Block
• RO membrane
• Tanano UltraPure 101
• Tanano UltraPure 102

Applications:

• Electronics
• Plating Industries
• Humidification Water
• Boiler Water
• Food Industries
• Chemical Analysis
• Chemical Production
• Hospital Process Water